Epson Digital Couture Fashion Week in New York 2016

Eleven selected designers from the Americas showcased their collections created using Epson’s state-of-the-art direct-to-garment and digital dye-sublimation printing. To commemorate the return of this showcase of designers coming together for fashion, this year’s theme for the presentation was “Harmony and Peace Through Fashion.”

Designers included: Chloe Trujillo from Los Angeles, Calif., Cristina Ruales from Brooklyn, N.Y., Fabrizzio Berrocal from Costa Rica, GM by Gustavo Moscoso from Ecuador, Kaleidoscopic by María de Lourdes Ramírez and Isabel Navarro Landa from Mexico, LENERD by Felipe Santamaría Luque from Colombia, Matías Hernán from Chile, Ossira by Agostina Orlandi and Ludmila Osikovsky from Argentina, Pionier by Janet Ríos and Carmen Artica from Peru, Santika by Danny Santiago from Miami, Fla., Tigresse by Fabio Yukio from Brazil


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